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  1. Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

  2. A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to
  3. 所属分类:其它

    • 发布日期:2021-02-10
    • 文件大小:309248
    • 提供者:weixin_38626473