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  1. Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

  2. For single layers of SiO2, Nb2O5, and Ta2O5 that are deposited by plasma-assisted reactive magnetron sputtering (PARMS), we present measurement results for basic optical and mechanical properties, in particular, optical index, intrinsic film stress,
  3. 所属分类:其它

    • 发布日期:2021-02-10
    • 文件大小:6291456
    • 提供者:weixin_38539705