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  1. Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system

  2. We study the co-existing four-wave mixing (FWM) process with two dressing fields and the six-wave mixing (SWM) process with one dressing field in a five-level system with carefully arranged laser beams. We also show two kinds of doubly dressing mecha
  3. 所属分类:其它

    • 发布日期:2021-02-26
    • 文件大小:756736
    • 提供者:weixin_38512781