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  1. E-beam lithography

  2. 介绍电子束光刻的资料,英文的。介绍电子束光刻的资料,英文的。介绍电子束光刻的资料,英文的。
  3. 所属分类:专业指导

    • 发布日期:2010-05-03
    • 文件大小:2097152
    • 提供者:wydzyx2003
  1. Multiphoton lithography : techniques, materials and applications

  2. Nanotechnology has great potential in manufacturing, manipulating, observing, and functioning of materials, and understanding the physics and chemistry at the nanoscale, but it is limited to surface science and technology in two dimensions, with use
  3. 所属分类:讲义

    • 发布日期:2019-02-09
    • 文件大小:17825792
    • 提供者:wang1062807258
  1. 基于AXIe中PCIe的高速图形传输系统.pdf

  2. 基于高通道高密度及高数据传输带宽的需求,凌华科技采用AXIe平台架构来建置E-Beam数据传输系统。本文说明如何充分发挥AXIe平台的
  3. 所属分类:其它

    • 发布日期:2019-09-05
    • 文件大小:369664
    • 提供者:weixin_38744207
  1. 使用eLAS事件,在b =标记的pp碰撞中,使用ATLAS探测器在pp碰撞中使用e-事件测量tt的生产横截面

  2. 本文介绍了在质量中心s = 13TeV处有质子碰撞的3.2fbâ1质子碰撞的数据样本,测量了包含性夸克对产生的横截面(σtt), 大型强子对撞机的ATLAS探测器在2015年收集了该数据。 此测量使用的是最终状态下带有相反电荷的电子-μ对的事件。 使用基于轨迹冲击参数和重构的次顶点的算法对包含b夸克的喷气机进行标记。 计算具有正好一个和正好两个b标记射流的事件数,并同时确定σtt和从顶夸克衰变重建和b标记射流的效率,从而最大程度地减少了相关的系统不确定性。 将该横截面测量为:σtt= 81
  3. 所属分类:其它

    • 发布日期:2020-04-02
    • 文件大小:1048576
    • 提供者:weixin_38702110
  1. “使用ATLAS探测器在s = 13 TeV的pp碰撞中使用带有b标记喷头的eμ事件和b标记喷头测量tt生产横截面”的更正。 来吧 B 761(2016)136]

  2. 本文描述了在质量中心能量为s = 13时质子碰撞为3.2fbâ1的质子碰撞的数据样本中包含性夸克对产生横截面(σtt)的测量。 TeV,2015年由大型强子对撞机的ATLAS探测器收集。 此测量使用的是最终状态下带有相反电荷的电子-μ对的事件。 使用基于轨迹冲击参数和重构的次顶点的算法对包含b夸克的喷气机进行标记。 计算具有正好一个和正好两个b标记射流的事件数,并同时确定σtt和从顶夸克衰变重建和b标记射流的效率,从而最大程度地减少了相关的系统不确定性。 将该横截面测量为:σtt= 81
  3. 所属分类:其它

    • 发布日期:2020-03-28
    • 文件大小:156672
    • 提供者:weixin_38527987
  1. 在LHeC上搜索带有极化$ e $ -Beam的异常$ WW \ gamma $和$ WWZ $耦合

  2. 我们通过测量$ ep \ to \ nu_ {e} q \ gamma X $和$ ep \ to \ nu_ {e} qZX的总横截面来检验约束异常$ WW \ gamma $和$ WWZ $耦合的可能性 电子束能量$ E_ {e} = 60 $ GeV和$ E_ {e} = 140 $ GeV在LHeC对撞机上的$$过程。 我们考虑非极化和极化电子束的情况。 异常耦合的上限和下限之差($ \ delta \ Delta \ kappa _ {\ gamma} $,$ \ delta \ la
  3. 所属分类:其它

    • 发布日期:2020-03-19
    • 文件大小:762880
    • 提供者:weixin_38739900
  1. What‘s after FinFET.pdf

  2. 半导体制造技术发展到FinFET以后节点继续scaling的方向,如GAA、NanoSheet等。benefits will be high performance, Jones said. At 5nm, it will cost $476 million to design a mainstream chip, compared to $349.2 million for 7nm and $62.9 million for 28nm, according to IBS 5525M s476.
  3. 所属分类:制造

    • 发布日期:2019-10-15
    • 文件大小:794624
    • 提供者:u010155987
  1. SimSolid-hanger-beam-tutorial.pdf

  2. SimSolid-hanger-beam-tutorialSimSolid Hanger beam tutorial Tutorial model descr iption Assembly info Hanger beam Length units: mm with 70 parts, Volume:1.35221e+7[mm]~3 Bounding box: 1050 x 1864 x 250 [mm] with 16 bolts/nuts, 32 washers Weight: 1040.
  3. 所属分类:专业指导

    • 发布日期:2019-07-21
    • 文件大小:1048576
    • 提供者:ieuuihc
  1. E-2D舰载预警机相关参数资料

  2. The APY-9 radar can operate in circular sweep mode or focus its beam to dwell on a wedge of the battlespace. E-2D is designed specifically to watch for threats like anti-ship or land-attack cruise missiles. Production E-2Ds will be capable of air ref
  3. 所属分类:制造

    • 发布日期:2020-09-30
    • 文件大小:2097152
    • 提供者:mxp281
  1. PCB技术中的lithography

  2. lithography是一种平板印刷技术,在平面光波回路的制作中一直发挥着重要的作用。具体过程如下:首先在二氧化硅为主要成分的芯层材料上面,淀积一层光刻胶;使用掩模版对光刻胶曝光固化,并在光刻胶层上形成固化的与掩模板完全对应的几何图形;对光刻胶上图形显影,与掩模对应的光刻胶图形可以使芯层材料抵抗刻蚀过程;使用等离子交互技术,将二氧化硅刻蚀成与光刻胶图形对应的芯层形状;光刻胶层剥离;最后在已经形成的芯层图形上面淀积上包层。使用lithography方法几乎可以在芯层
  3. 所属分类:其它

    • 发布日期:2020-12-09
    • 文件大小:29696
    • 提供者:weixin_38534444
  1. Accurate analysis of ellipsometric data for thick transparent f ilms

  2. Using e-beam evaporation, the ellipsometric parameters of thick transparent films are studied with the modified analysis method for the SiO2 film samples deposited onto the Si substrate. The ellipsometric parameters are measured at the incidence angl
  3. 所属分类:其它

    • 发布日期:2021-02-22
    • 文件大小:374784
    • 提供者:weixin_38717143
  1. Single-beam self-referenced phase-sensitive surface plasmon resonance sensor with high detection resolution

  2. A versatile and low-cost single-beam self-referenced phase-sensitive surface plasmon resonance (SPR) sensing system with ultra-high resolution performance is presented. The system exhibits a root-mean-square phase fluctuation of +-0.0028 angle over a
  3. 所属分类:其它

    • 发布日期:2021-02-13
    • 文件大小:270336
    • 提供者:weixin_38686231
  1. Laser induced damage of multi-layer dielectric used in pulse compressor gratings

  2. Laser induced damage threshold (LIDT) of multi-layer dielectric used in pulse compressor gratings (PCG) was investigated. The sample was prepared by e-beam evaporation (EBE). LIDT was detected following ISO standard 11254-1.2. It was found that LIDTs
  3. 所属分类:其它

    • 发布日期:2021-02-11
    • 文件大小:285696
    • 提供者:weixin_38605590
  1. Beam-Java-源码

  2. Beam-Java e 安装演练 1)下载JDK版本8 2)设置环境变量 3)下载二进制zip存档 4)解压缩文件,将apache maven的bin目录的路径添加到PATH,并使用“ mvn -v”检查版本 5)将依赖项添加到pom.xml文件 基本字数
  3. 所属分类:其它

    • 发布日期:2021-02-11
    • 文件大小:1048576
    • 提供者:weixin_42136365
  1. The mulDamage characteristics of HfO

  2. P-polarization high reflectors are deposited by e-beam from hafnia and silica. 1-on-1 and N-on-1 tests at 1064-nm wavelength with P-polarization at 45° incidence are carried out on these samples. Microscope and scanning electron microscope are applie
  3. 所属分类:其它

    • 发布日期:2021-02-10
    • 文件大小:1048576
    • 提供者:weixin_38558054
  1. Experimental study of sweep control in e-beam evaporated optical coatings

  2. High performance optical coating requires excellent uniformity of thin-film. Keeping the surface of evaporation material flat is propitious for the stability of vapor plume, and can improve the uniformity of thin-film. Based on the principle of elect
  3. 所属分类:其它

    • 发布日期:2021-02-09
    • 文件大小:716800
    • 提供者:weixin_38752282
  1. Investigation of Bessel beam propagation in scattering media with scalar diffraction method

  2. Bessel beam propagation in scattering media is simulated using the angular spectrum method combined with slice-by-slice propagation model. Generating Bessel beams with a spatial light modulator, which provides a means to adjust flexibly the parameter
  3. 所属分类:其它

    • 发布日期:2021-02-08
    • 文件大小:2097152
    • 提供者:weixin_38659789
  1. Experimental determination of the azimuthal and radial mode orders of a partially coherent LGpl beam (Invited Paper)

  2. It is known that one can determine the mode orders (i.e., the azimuthal order and radial order) of a partially coherent LGpl beam (i.e., a partially coherent vortex beam) based on the measurement of the cross-correlation function (CCF) and the double
  3. 所属分类:其它

    • 发布日期:2021-02-07
    • 文件大小:750592
    • 提供者:weixin_38640150
  1. Dispersion effects on performance of free-electron laser based on laser wakefield accelerator

  2. In this study, we investigate a new simple scheme using a planar undulator (PU) together with a properly dispersed electron beam ($e$ beam) with a large energy spread (${\sim}1\%$) to enhance the free-electron laser (FEL) gain. For a dispersed $e$ be
  3. 所属分类:其它

    • 发布日期:2021-02-06
    • 文件大小:1048576
    • 提供者:weixin_38618819
  1. Influence of oxygen plasma treatment on properties of ZrO2 films prepared by e-beam evaporation techniques

  2. Zirconia films were prepared by e-beam evaporation, and oxygen plasma treatment was used to modify film properties. Spectrophotometry, x-ray diffractometry (XRD), and atomic force microscopy were used to characterize refractive index, extinction coef
  3. 所属分类:其它

    • 发布日期:2021-02-06
    • 文件大小:592896
    • 提供者:weixin_38529239
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