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  1. Fabrication of submicron magnetic oxide antidot arrays by combining nanosphere lithography with sputtering technology

  2. Fabrication of submicron magnetic oxide antidot arrays by combining nanosphere lithography with sputtering technology

  3. 所属分类：其它

    • 发布日期：2021-02-20
    • 文件大小：757760
    • 提供者：weixin_38723527