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  1. High ion current density plasma source for ion-assisted deposition of optical thin films

  2. A plasma source utilizing direct current (DC) voltage between an anode and a hot hollow cathode is employed to create high-density plasma. Plasma spatial distribution, ion energy, plasma neutralisation, and current densities are found to be separatel
  3. 所属分类:其它

    • 发布日期:2021-02-10
    • 文件大小:1048576
    • 提供者:weixin_38748556