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  1. In-situ end-point detection during ion-beam etching of multilayer dielectric gratings

  2. An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and the beam retro-diffracted by the
  3. 所属分类:其它

    • 发布日期:2021-02-11
    • 文件大小:201728
    • 提供者:weixin_38596267