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  1. Intrinsic stress analysis of sputtered carbon film

  2. Intrinsic stresses of carbon films deposited by direct current (DC) magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses. T
  3. 所属分类:其它

    • 发布日期:2021-02-26
    • 文件大小:329728
    • 提供者:weixin_38690149