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  1. Nonuniform self-imaging of achromatic Talbot lithography

  2. Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an excellent technique for large area periodic nano-fabrication. In this work, the uniformity of pattern distribution in ATL was studied in detail. Two ATL transmiss
  3. 所属分类:其它

    • 发布日期:2021-02-22
    • 文件大小:813056
    • 提供者:weixin_38644097