您好,欢迎光临本网站![请登录][注册会员]  

搜索资源列表

  1. Optical design for EUV lithography source collector

  2. Wolter I collector is the best collector for extreme ultraviolet (EUV) lithography, which has a series of nested mirrors. It has high collection efficiency and can obtain more uniform intensity distribution at the intermediate focus (IF). A new desig
  3. 所属分类:其它

    • 发布日期:2021-02-13
    • 文件大小:430080
    • 提供者:weixin_38553681