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  1. Transition from isolated submicrometer pits to integral ablation of HfO2 and SiO2 films under subpicosecond irradiation

  2. Transition from isolated submicrometer pits to integral ablation of HfO2 and SiO2 films under subpicosecond irradiation

  3. 所属分类：其它

    • 发布日期：2021-02-11
    • 文件大小：2097152
    • 提供者：weixin_38728277