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  1. VOx films prepared by DC magnetron sputtering

  2. VOx films fabricated by direct currect (DC) magnetron sputtering using a high pure vanadium metal target (99.99%) are reported. The impact of the temperature coefficient of resistance (TCR), the effects of Ar/O2 ratio on the deposition, the sputterin
  3. 所属分类:其它

    • 发布日期:2021-02-10
    • 文件大小:195584
    • 提供者:weixin_38733414