Plasma processing. Advantages and disadvantages compared to wet etching. Lithography process. Overview of oxygen plasma etching. Qualitative descr iption of Debye shielding. Descr iption of glow discharge. Reactive ion etching versus plasma etching.
Plasma processing. Advantages and disadvantages compared to wet etching. Lithography process. Overview of oxygen plasma etching. Qualitative descr iption of Debye shielding. Descr iption of glow discharge. Reactive ion etching versus plasma etching.
Plasma processing. Advantages and disadvantages compared to wet etching. Lithography process. Overview of oxygen plasma etching. Qualitative descr iption of Debye shielding. Descr iption of glow discharge. Reactive ion etching versus plasma etching.
A hexagonal array grating based on selective etching of a 2D ferroelectric domain inversion in a periodically poled MgO-doped LiNbO3 crystal is fabricated. The effects to the diffractive self-imaging as a function of diffraction distance for a fixed
In this Letter, we propose a method of fabricating linear variable filters by ion beam etching with masking mechanisms. A triangle-shaped mask is designed and set between the ion source and sample. During the ion etching, the sample is moved back and
A method for fabricating deep grating structures on a silicon carbide (SiC) surface by a femtosecond laser and chemical-selective etching is developed. Periodic lines corresponding to laser-induced structure change (LISC) are formed by femtosecond la
A method of multi-beam femtosecond laser irradiation combined with modified HF-HNO3-CH3COOH etching is used for the parallel fabrication of all-silicon plano-concave microlens arrays (MLAs). The laser beam is split by a diffractive optical element an
In this letter, the application of dry etching to prepare Black Silicon nanostructures on crystalline silicon thin films on glass is described. The utilized reactive ion etching with an inductively coupled plasma (ICP-RIE) of SF6 and O2 is discussed
An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and the beam retro-diffracted by the
Patterning of self-assembled monolayer (SAM) was demonstrated by area-selective deposition of SAMs on a pattern made by synchrotron radiation (SR) stimulated etching SiO2 thin films. The etching was conducted by exposing the SiO2 films to SR through
We report the fabrication and characterization of silicon carbide microdisks on top of silicon pillars suited for applications from near- to mid-infrared. We probe 10 μm diameter disks with different under-etching depths, from 4 μm down to 1.4 μm, fa
