A lithographic process capable of manufacturing state of the art chips faces many difficult challenges. Not only must the process resolve the minimum feature size but overlay errors must be held to tight tolerances, exquisitely complex patterns must
New applications of evanescent imaging for microlithography are introduced. The use of evanescent wave lithography (EWL) has been employed for 26nm resolution at 1.85NA using a 193nm ArF excimer laser wavelength to record images in a photoresist wit
