台大 文献 Due to a pulsed power offering the instant energy for extremely high plasma density, the purpose of this study is to develop the real-time monitoring system for the modern pulsed plasma coating by the LabVIEW technique. One selected exampl of
A comprehensive material study of different transparent conductive oxides (TCOs) is presented. The layers are deposited by pulsed direct current (DC) magnetron sputtering in an inline sputtering system. Indium tin oxide (ITO) films are studied in det
Molybdenum (Mo) thin films, most commonly used as electrical back contacts in Cu(In,Ga)Se2 (CIGS) solar cells, are deposited by rf and dc magnetron sputtering in identical systems to study the discrepancy and growth mechanisms of the two sputtering t
SiOx (x=0--2) films were deposited on BK-7 substrates by a low frequency reactive magnetron sputtering system with the oxygen flow rate (OFR) changing from 0 to 30 sccm. The samples were characterized by atomic force microscopy, spectrophotometer, an
The optical properties of both the annealed and as-deposited ZnO thin films by radio frequency (RF) magnetron sputtering on SiO2 substrates were studied. In the annealed films, two pronounced well defined exciton absorption peaks for the A and B exci
The single-sided and dual-sided high reflective mirrors were deposited with ion-beam sputtering (IBS). When the incident light entered with 45 degrees, the reflectance of p-polarized light at 1064 nm exceeded 99.5%. Spectrum was gained by spectromete
X-ray supermirror is a non-periodic multilayer structure, whose optical performance is greatly affected by the stability and accuracy of the deposition rate in the fabrication using the direct current (DC) magnetron sputtering. By considering the loc
The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With the oxygen ratio increasing, the r
For single layers of SiO2, Nb2O5, and Ta2O5 that are deposited by plasma-assisted reactive magnetron sputtering (PARMS), we present measurement results for basic optical and mechanical properties, in particular, optical index, intrinsic film stress,
VOx films fabricated by direct currect (DC) magnetron sputtering using a high pure vanadium metal target (99.99%) are reported. The impact of the temperature coefficient of resistance (TCR), the effects of Ar/O2 ratio on the deposition, the sputterin
SnO2 thin films with good orientation are prepared on a glass substrate by radio frequence (RF) reactive sputtering. The phases of the thin films before and after annealing are analyzed by X-ray diffraction (XRD) spectroscopy, and the surface morphol
Heavily doped Ga-doped ZnO (resistivity similar to 8 x 10(-4) Omega cm and optical transmittance 96%) were fabricated by radio frequency magnetron sputtering. Post-growth annealing studies in H-2-Ar and pure Ar atmospheres were conducted. No noticeab
Antistatic and antireflection (ASAR) coating using indium tin oxide (ITO) by magnetron reactive sputtering (MRS) technique is presented. The relationship between sheet resistance and optical transmittance of ITO prepared by MRS is investigated, and t
